Electron scattering mechanisms in GZO films grown on a-sapphire substrates by plasma-enhanced molecular beam epitaxy

Deep ultraviolet photodetectors grown by gas source molecular beam epitaxy on sapphire and AlGaN/sapphire substrates

Optically-based chemical and biological sensors require optoelectronic devices with specific emission and detection wavelength ranges. Semiconductor optoelectronic devices applicable to this sensing are of particular interest due to their low power consumption, compact size, long lifetime, and low cost. We report the electrical and optical properties of deep UV p-i-n photodiodes (PDs) based on ...

Defect reduction with quantum dots in GaN grown on sapphire substrates by molecular beam epitaxy

Ge films grown on Si substrates by molecular - beam epitaxy below 450 ° C

Ge thin films are grown on Si~001! substrates by molecular-beam epitaxy at 370 °C. The low-temperature epitaxial growth is compatible with the back-end thermal budget of current generation complementary metal-oxide-semiconductor technology, which is restricted to less than 450 °C. Reflection high-energy electron diffraction shows that single-crystal Ge thin films with smooth surfaces could be a...

Structural and optical properties of GaN films grown on GaAs substrates by molecular beam epitaxy

GaN films are grown on [0 0 1] GaAs substrates by plasma-assisted molecular beam epitaxy using a three-step process that consists of a substrate nitridation, deposition of a low-temperature buffer layer, and a high-temperature overgrowth. X-ray diffraction and transmission electron microscopy indicate that this method promotes prismatic growth of c-oriented a-GaN. Photoluminescence studies show...

High-mobility thin InSb films grown by molecular beam epitaxy

The problem of preparing high-mobility thin InSb films is revisited for magnetoresistive and spintronic sensor applications. We introduce a growth process that significantly improves the electrical properties of thin unintentionally doped InSb layers ~60–300 nm! epitaxially grown on GaAs~100! substrates by reducing the density of dislocations within the interfacial layer. The epilayer propertie...